A Review on Thin Film Technology and Nanomaterial Characterization Techniques

Rai Dhirendra Prasad*, Shivanand B. Teli, Rai Surendra Prasad, Rai Bishvendra Prasad, Saurabh R. Prasad, Pramode Sinha, Amit Sinha, Preety Sinha, Mamata Saxena, Rai Rajnarayan Prasad, R. S. Pande, Naresh Charmode, K. G. Deshmukh, Prashant D. Sarvalkar, U. D. Kadam, Chandrasekhar Chiplunkar, Nirmala Prasad, M. V. Padvi, Zhanhu Guo

*Corresponding author for this work

Research output: Contribution to journalReview articlepeer-review

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Abstract

Over the last 200 years, there has been an increase in the process of depositing thin film materials, which has been considerably developing. A good understanding of the various deposition methods and processes is necessary to improve the desired film thickness and characteristics. The purpose of this review paper is to display the critical analysis of existing thin film deposition methods. The paper discusses some important thin film techniques that are advanced and suitable for the analysis of thin films. Nanomaterials are invisible and require various advanced characterization to investigate their physical and chemical properties. Therefore, it becomes essential to determine these properties: there is a need for advanced scientific tools for the analysis of nanomaterials and thin films. A comprehensive list of fundamentals of thin film technology, including deposition, structure, film properties, advanced characterization tools and applications are presented together.

Original languageEnglish
Article number1198
Number of pages47
JournalES Materials and Manufacturing
Volume25
Early online date29 Jul 2024
DOIs
Publication statusPublished - 1 Sept 2024

Keywords

  • Applications
  • Characterization tools
  • Deposition techniques
  • Electrical properties
  • Nanomaterials
  • Optical properties, mechanical properties
  • Thin Films

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