Characterization of Si nanocrystals embedded in SiO2 with X-Ray photoelectron spectroscopy

Yang Liu, Tu Pei Chen, Yong Qing Fu, Jang-Hsing Hsieh

Research output: Contribution to journalArticlepeer-review

Abstract

X-ray photoelectron spectroscopy (XPS) has been used to characterize the Si nanocrystals (nc-Si) incorporated in SiO2 by ion implantation and subsequent thermal annealing. XPS results suggest that the as-implanted films contain a composition of a few suboxide SiOx (x
Original languageEnglish
Pages (from-to)11-14
JournalJournal of Metastable and Nanocrystalline Materials
Volume23
DOIs
Publication statusPublished - 2005

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