Characterization of Si nanocrystals embedded in SiO2 with X-Ray photoelectron spectroscopy

Yang Liu; Tu Pei Chen; Yong Qing Fu; Jang-Hsing Hsieh

doi:10.4028/www.scientific.net/JMNM.23.11

Characterization of Si nanocrystals embedded in SiO2 with X-Ray photoelectron spectroscopy

Yang Liu, Tu Pei Chen, Yong Qing Fu, Jang-Hsing Hsieh

Research output: Contribution to journal › Article › peer-review

Abstract

X-ray photoelectron spectroscopy (XPS) has been used to characterize the Si nanocrystals (nc-Si) incorporated in SiO2 by ion implantation and subsequent thermal annealing. XPS results suggest that the as-implanted films contain a composition of a few suboxide SiOx (x

Original language	English
Pages (from-to)	11-14
Journal	Journal of Metastable and Nanocrystalline Materials
Volume	23
DOIs	https://doi.org/10.4028/www.scientific.net/JMNM.23.11
Publication status	Published - 2005

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title = "Characterization of Si nanocrystals embedded in SiO2 with X-Ray photoelectron spectroscopy",

abstract = "X-ray photoelectron spectroscopy (XPS) has been used to characterize the Si nanocrystals (nc-Si) incorporated in SiO2 by ion implantation and subsequent thermal annealing. XPS results suggest that the as-implanted films contain a composition of a few suboxide SiOx (x",

author = "Yang Liu and Chen, \{Tu Pei\} and Fu, \{Yong Qing\} and Jang-Hsing Hsieh",

year = "2005",

doi = "10.4028/www.scientific.net/JMNM.23.11",

language = "English",

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journal = "Journal of Metastable and Nanocrystalline Materials",

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T1 - Characterization of Si nanocrystals embedded in SiO2 with X-Ray photoelectron spectroscopy

AU - Liu, Yang

AU - Chen, Tu Pei

AU - Fu, Yong Qing

AU - Hsieh, Jang-Hsing

PY - 2005

Y1 - 2005

N2 - X-ray photoelectron spectroscopy (XPS) has been used to characterize the Si nanocrystals (nc-Si) incorporated in SiO2 by ion implantation and subsequent thermal annealing. XPS results suggest that the as-implanted films contain a composition of a few suboxide SiOx (x

AB - X-ray photoelectron spectroscopy (XPS) has been used to characterize the Si nanocrystals (nc-Si) incorporated in SiO2 by ion implantation and subsequent thermal annealing. XPS results suggest that the as-implanted films contain a composition of a few suboxide SiOx (x

UR - https://www.scopus.com/pages/publications/12344285800

U2 - 10.4028/www.scientific.net/JMNM.23.11

DO - 10.4028/www.scientific.net/JMNM.23.11

M3 - Article

SN - 1422-6375

VL - 23

SP - 11

EP - 14

JO - Journal of Metastable and Nanocrystalline Materials

JF - Journal of Metastable and Nanocrystalline Materials

ER -

Characterization of Si nanocrystals embedded in SiO2 with X-Ray photoelectron spectroscopy

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