Characterization of TiNi shape-memory alloy thin films for MEMS applications

Yong Qing Fu; Wei Min Huang; Hejun Du; Xu Huang; Junping Tan; Xiangyang Gao

doi:10.1016/S0257-8972(01)01324-X

Characterization of TiNi shape-memory alloy thin films for MEMS applications

Yong Qing Fu, Wei Min Huang, Hejun Du, Xu Huang, Junping Tan, Xiangyang Gao

Mathematics, Physics and Electrical Engineering

Research output: Contribution to journal › Article › peer-review

216 Citations (Scopus)

Abstract

Thin film shape-memory alloys (SMAs) have been recognized as promising and high performance materials in the field of microelectromechanical systems (MEMS) applications. In this investigation, chemical composition, microstructure and phase transformation behaviors of sputter deposited TiNi films were studied. The surface and cross-section morphology of the deposited coating was analyzed using atomic force microscopy (AFM) and scanning electron microscopy (SEM). The results from the differential scanning calorimeter (DSC) showed clearly the martensitic transformation upon heating and cooling. X-Ray diffraction analysis (XRD) also revealed the crystalline structure changing with temperature. By depositing TiNi films on the bulk micromachined Si cantilever structures, micro-beams exhibiting a good shape-memory effect were obtained. Finite element simulation results of the deformation of micro-beam (using the measured NiTi thin film parameters) agree quite well with the measured behavior.

Original language	English
Pages (from-to)	107-112
Journal	Surface and Coatings Technology
Volume	145
Issue number	1-3
DOIs	https://doi.org/10.1016/S0257-8972(01)01324-X
Publication status	Published - Aug 2001

Keywords

Shape-memory
TiNi
sputtering
thin films
MEMS

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10.1016/S0257-8972(01)01324-X

Cite this

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title = "Characterization of TiNi shape-memory alloy thin films for MEMS applications",

abstract = "Thin film shape-memory alloys (SMAs) have been recognized as promising and high performance materials in the field of microelectromechanical systems (MEMS) applications. In this investigation, chemical composition, microstructure and phase transformation behaviors of sputter deposited TiNi films were studied. The surface and cross-section morphology of the deposited coating was analyzed using atomic force microscopy (AFM) and scanning electron microscopy (SEM). The results from the differential scanning calorimeter (DSC) showed clearly the martensitic transformation upon heating and cooling. X-Ray diffraction analysis (XRD) also revealed the crystalline structure changing with temperature. By depositing TiNi films on the bulk micromachined Si cantilever structures, micro-beams exhibiting a good shape-memory effect were obtained. Finite element simulation results of the deformation of micro-beam (using the measured NiTi thin film parameters) agree quite well with the measured behavior.",

keywords = "Shape-memory, TiNi, sputtering, thin films, MEMS",

author = "Fu, {Yong Qing} and Huang, {Wei Min} and Hejun Du and Xu Huang and Junping Tan and Xiangyang Gao",

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doi = "10.1016/S0257-8972(01)01324-X",

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journal = "Surface and Coatings Technology",

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TY - JOUR

T1 - Characterization of TiNi shape-memory alloy thin films for MEMS applications

AU - Fu, Yong Qing

AU - Huang, Wei Min

AU - Du, Hejun

AU - Huang, Xu

AU - Tan, Junping

AU - Gao, Xiangyang

PY - 2001/8

Y1 - 2001/8

N2 - Thin film shape-memory alloys (SMAs) have been recognized as promising and high performance materials in the field of microelectromechanical systems (MEMS) applications. In this investigation, chemical composition, microstructure and phase transformation behaviors of sputter deposited TiNi films were studied. The surface and cross-section morphology of the deposited coating was analyzed using atomic force microscopy (AFM) and scanning electron microscopy (SEM). The results from the differential scanning calorimeter (DSC) showed clearly the martensitic transformation upon heating and cooling. X-Ray diffraction analysis (XRD) also revealed the crystalline structure changing with temperature. By depositing TiNi films on the bulk micromachined Si cantilever structures, micro-beams exhibiting a good shape-memory effect were obtained. Finite element simulation results of the deformation of micro-beam (using the measured NiTi thin film parameters) agree quite well with the measured behavior.

AB - Thin film shape-memory alloys (SMAs) have been recognized as promising and high performance materials in the field of microelectromechanical systems (MEMS) applications. In this investigation, chemical composition, microstructure and phase transformation behaviors of sputter deposited TiNi films were studied. The surface and cross-section morphology of the deposited coating was analyzed using atomic force microscopy (AFM) and scanning electron microscopy (SEM). The results from the differential scanning calorimeter (DSC) showed clearly the martensitic transformation upon heating and cooling. X-Ray diffraction analysis (XRD) also revealed the crystalline structure changing with temperature. By depositing TiNi films on the bulk micromachined Si cantilever structures, micro-beams exhibiting a good shape-memory effect were obtained. Finite element simulation results of the deformation of micro-beam (using the measured NiTi thin film parameters) agree quite well with the measured behavior.

KW - Shape-memory

KW - TiNi

KW - sputtering

KW - thin films

KW - MEMS

U2 - 10.1016/S0257-8972(01)01324-X

DO - 10.1016/S0257-8972(01)01324-X

M3 - Article

SN - 0257-8972

SN - 1879-3347

VL - 145

SP - 107

EP - 112

JO - Surface and Coatings Technology

JF - Surface and Coatings Technology

IS - 1-3

ER -

Characterization of TiNi shape-memory alloy thin films for MEMS applications

Abstract

Keywords

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