Abstract
Thin film CdTe photovoltaic (PV) devices and reference layers obtained by the atmospheric pressure metalorganic vapour deposition (AP-MOCVD) method have been studied for their chemical structure using plasma profiling time-of-flight-mass spectroscopy (PP-TOFMS, also called glow discharge TOFMS). Different levels of arsenic (As) dopant in CdTe films were measured by PP-TOFMS and compared to results obtained from a more conventional depth profiling method (secondary ion mass spectrometry or SIMS). This comparison showed that PP-TOFMS has the sufficient sensitivity towards detection of the As dopant in CdTe and hence is suited as a rapid, low vacuum tool in controlling the large scale production of CdTe PV materials.
Original language | English |
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Pages (from-to) | 82-85 |
Journal | Materials Research Innovations |
Volume | 9 |
Issue number | 1 |
DOIs | |
Publication status | Published - Mar 2014 |
Keywords
- CdTe thin film PV
- Glow discharge
- Plasma profiling (PP)-TOFMS
- Depth profiling