Comparison of Conventional and Maskless Lithographic Techniques for More than Moore Post-processing of Foundry CMOS Chips

Andreas Tsiamis; Yifan Li; Camelia Dunare; Jamie Marland; Ewen Blair; Stewart Smith; Jonathan G. Terry; Srinjoy Mitra; Ian Underwood; Alan Murray; Anthony J. Walton

doi:10.1109/jmems.2020.3015964

Comparison of Conventional and Maskless Lithographic Techniques for More than Moore Post-processing of Foundry CMOS Chips

Andreas Tsiamis, Yifan Li, Camelia Dunare, Jamie Marland, Ewen Blair, Stewart Smith, Jonathan G. Terry, Srinjoy Mitra, Ian Underwood, Alan Murray, Anthony J. Walton

Mechanical and Construction Engineering Department

Research output: Contribution to journal › Article › peer-review

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Abstract

This article details and compares the technology options for post-processing foundry produced CMOS at chip-scale to enable More than Moore functionality. In many cases there are attractions in using chip-based processing through the Multi-Project Wafer route that is frequently employed in research, early-stage development and low-volume production. This article identifies that spray-based photoresist deposition combined with optical maskless lithography demonstrates sufficient performance combined with low cost and operational convenience to offer an attractive alternative to conventional optical lithography, where spin-coated photoresist is exposed through a patterned photomask. [2020-0249]

Original language	English
Pages (from-to)	1245-1252
Number of pages	8
Journal	Journal of Microelectromechanical Systems
Volume	29
Issue number	5
Early online date	21 Aug 2020
DOIs	https://doi.org/10.1109/jmems.2020.3015964
Publication status	Published - Oct 2020

Keywords

CMOS
spray-coating
maskless
spin-coating
More than Moore
on-chip
post-processing
photomask
optical lithography

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10.1109/jmems.2020.3015964

JMEMS-2020-0249 - submittedAccepted author manuscript, 8.47 MB

Cite this

Tsiamis, A., Li, Y., Dunare, C., Marland, J., Blair, E., Smith, S., Terry, J. G., Mitra, S., Underwood, I., Murray, A., & Walton, A. J. (2020). Comparison of Conventional and Maskless Lithographic Techniques for More than Moore Post-processing of Foundry CMOS Chips. Journal of Microelectromechanical Systems, 29(5), 1245-1252. https://doi.org/10.1109/jmems.2020.3015964

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AU - Blair, Ewen

AU - Smith, Stewart

AU - Terry, Jonathan G.

AU - Mitra, Srinjoy

AU - Underwood, Ian

AU - Murray, Alan

AU - Walton, Anthony J.

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KW - CMOS

KW - spray-coating

KW - maskless

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Comparison of Conventional and Maskless Lithographic Techniques for More than Moore Post-processing of Foundry CMOS Chips

Abstract

Keywords

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