Conformal CVD-grown MoS2 on Three-dimensional Woodpile Photonic Crystals for Photonic Bandgap Engineering

Mike Taverne; Xu  Zheng; Yu-Shao Jacky Chen; Katrina A. Morgan; Lifeng Chen; Nadira Meethale Palakkool; Daniel Rezaie; Habib Awachi; John G.  Rarity; Daniel W.  Hewak; Chung-Che Huang; Ying-Lung Daniel Ho

doi:10.1021/acsaom.3c00055

Conformal CVD-grown MoS2 on Three-dimensional Woodpile Photonic Crystals for Photonic Bandgap Engineering

Mike Taverne, Xu Zheng, Yu-Shao Jacky Chen, Katrina A. Morgan, Lifeng Chen, Nadira Meethale Palakkool, Daniel Rezaie, Habib Awachi, John G. Rarity^*, Daniel W. Hewak, Chung-Che Huang^*, Ying-Lung Daniel Ho^*

^*Corresponding author for this work

Mathematics, Physics and Electrical Engineering

Research output: Contribution to journal › Article › peer-review

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Abstract

To achieve the modification of photonic band structures and realize the dispersion control toward functional photonic devices, composites of photonic crystal templates with high-refractive-index material are fabricated. A two-step process is used: 3D polymeric woodpile templates are fabricated by a direct laser writing method followed by chemical vapor deposition of MoS 2. We observed red-shifts of partial bandgaps at the near-infrared region when the thickness of deposited MoS 2 films increases. A ∼10 nm red-shift of fundamental and high-order bandgap is measured after each 1 nm MoS 2 thin film deposition and confirmed by simulations and optical measurements using an angle-resolved Fourier imaging spectroscopy system.

Original language	English
Pages (from-to)	990-996
Number of pages	7
Journal	ACS Applied Optical Materials
Volume	1
Issue number	5
Early online date	10 May 2023
DOIs	https://doi.org/10.1021/acsaom.3c00055
Publication status	Published - 26 May 2023

Keywords

direct laser writing
two-photon lithography
chemical vapor deposition
chalcogenide materials
photonic bandgap
three-dimensional photonic crystals

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10.1021/acsaom.3c00055Licence: CC BY

acsaom.3c00055Final published version, 3.49 MBLicence: CC BY

Cite this

@article{e6b6855bbff5461e967433627f1bf22f,

title = "Conformal CVD-grown MoS2 on Three-dimensional Woodpile Photonic Crystals for Photonic Bandgap Engineering",

abstract = "To achieve the modification of photonic band structures and realize the dispersion control toward functional photonic devices, composites of photonic crystal templates with high-refractive-index material are fabricated. A two-step process is used: 3D polymeric woodpile templates are fabricated by a direct laser writing method followed by chemical vapor deposition of MoS 2. We observed red-shifts of partial bandgaps at the near-infrared region when the thickness of deposited MoS 2 films increases. A ∼10 nm red-shift of fundamental and high-order bandgap is measured after each 1 nm MoS 2 thin film deposition and confirmed by simulations and optical measurements using an angle-resolved Fourier imaging spectroscopy system. ",

keywords = "direct laser writing, two-photon lithography, chemical vapor deposition, chalcogenide materials, photonic bandgap, three-dimensional photonic crystals",

author = "Mike Taverne and Xu Zheng and Chen, {Yu-Shao Jacky} and Morgan, {Katrina A.} and Lifeng Chen and {Meethale Palakkool}, Nadira and Daniel Rezaie and Habib Awachi and Rarity, {John G.} and Hewak, {Daniel W.} and Chung-Che Huang and Ho, {Ying-Lung Daniel}",

note = "Funding information: This work was carried out using the computational facilities of the Advanced Computing Research Centre, University of Bristol, Bristol, UK, and was funded by the Engineering and Physical Sciences Research Council (EPSRC) grants EP/M009033/1, EP/M024458/1, EP/V040030/1, EP/M008487/1, and EP/N00762X/1, and the Royal Society research grant RGS\R1\221031.",

year = "2023",

month = may,

day = "26",

doi = "10.1021/acsaom.3c00055",

language = "English",

volume = "1",

pages = "990--996",

journal = "ACS Applied Optical Materials",

issn = "2771-9855",

publisher = "American Chemical Society (ACS)",

number = "5",

}

TY - JOUR

T1 - Conformal CVD-grown MoS2 on Three-dimensional Woodpile Photonic Crystals for Photonic Bandgap Engineering

AU - Taverne, Mike

AU - Zheng, Xu

AU - Chen, Yu-Shao Jacky

AU - Morgan, Katrina A.

AU - Chen, Lifeng

AU - Meethale Palakkool, Nadira

AU - Rezaie, Daniel

AU - Awachi, Habib

AU - Rarity, John G.

AU - Hewak, Daniel W.

AU - Huang, Chung-Che

AU - Ho, Ying-Lung Daniel

N1 - Funding information: This work was carried out using the computational facilities of the Advanced Computing Research Centre, University of Bristol, Bristol, UK, and was funded by the Engineering and Physical Sciences Research Council (EPSRC) grants EP/M009033/1, EP/M024458/1, EP/V040030/1, EP/M008487/1, and EP/N00762X/1, and the Royal Society research grant RGS\R1\221031.

PY - 2023/5/26

Y1 - 2023/5/26

N2 - To achieve the modification of photonic band structures and realize the dispersion control toward functional photonic devices, composites of photonic crystal templates with high-refractive-index material are fabricated. A two-step process is used: 3D polymeric woodpile templates are fabricated by a direct laser writing method followed by chemical vapor deposition of MoS 2. We observed red-shifts of partial bandgaps at the near-infrared region when the thickness of deposited MoS 2 films increases. A ∼10 nm red-shift of fundamental and high-order bandgap is measured after each 1 nm MoS 2 thin film deposition and confirmed by simulations and optical measurements using an angle-resolved Fourier imaging spectroscopy system.

AB - To achieve the modification of photonic band structures and realize the dispersion control toward functional photonic devices, composites of photonic crystal templates with high-refractive-index material are fabricated. A two-step process is used: 3D polymeric woodpile templates are fabricated by a direct laser writing method followed by chemical vapor deposition of MoS 2. We observed red-shifts of partial bandgaps at the near-infrared region when the thickness of deposited MoS 2 films increases. A ∼10 nm red-shift of fundamental and high-order bandgap is measured after each 1 nm MoS 2 thin film deposition and confirmed by simulations and optical measurements using an angle-resolved Fourier imaging spectroscopy system.

KW - direct laser writing

KW - two-photon lithography

KW - chemical vapor deposition

KW - chalcogenide materials

KW - photonic bandgap

KW - three-dimensional photonic crystals

U2 - 10.1021/acsaom.3c00055

DO - 10.1021/acsaom.3c00055

M3 - Article

C2 - 37255502

SN - 2771-9855

VL - 1

SP - 990

EP - 996

JO - ACS Applied Optical Materials

JF - ACS Applied Optical Materials

IS - 5

ER -