Developing an empirical relationship for optimizing surface roughness of TiC thin film grown by magnetron sputtering using Taguchi analysis

Olayinka Abegunde*, Esther Akinlabi, Philip Oladijo

*Corresponding author for this work

Research output: Contribution to journalConference articlepeer-review

2 Citations (Scopus)


The surface roughness of thin films coating is an important factor that affects the performance capability of material in industrial and scientific application. Surface roughness influences properties such has nanohardness, wear, friction and corrosion. This research focuses on the influence of RF magnetron process parameters on the surface roughness of TiC thin film grown on Ti6Al4V substrate. Taguchi optimization method was used to determine the contribution ratio of the RF sputtering process parameters and mathematical predictive models were developed for optimization of TiC thin film surface roughness. The structural characterization of the TiC thin film was examined using Grazing incidence X-ray diffractometer. The optimization analysis revealed that the RF power contributed the most to the behaviour of the TiC thin film surface roughness with a contribution rate of 87.97%. The percentage error from the predictive models developed are very meagre and shows good agreement with the acceptable limit. From the GIXRD analysis, the (200) orientation plane was noticed to be the preferential peak in all the coatings.

Original languageEnglish
Pages (from-to)3282-3287
Number of pages6
JournalMaterials Today: Proceedings
Publication statusPublished - 2019
Externally publishedYes
Event10th International Conference of Materials Processing and Characterization, ICMPC 2020 - Mathura, India
Duration: 21 Feb 202023 Feb 2020

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