Electrochemical Strategy for High-Resolution Nanostructures in Laser-Heat-Mode Resist Toward Next Generation Diffractive Optical Elements

Zhengwei Wang, Guodong Chen, Ming Wen*, Xutao Hu, Xing Liu, Jingsong Wei*, Qingsheng Wu, Yongqing Fu

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

Abstract

For achieving high-resolution nanostructures for next-generation diffractive optical elements (DOEs) using an environmentally friendly process, an electrochemical development strategy is proposed and developed using AgInSbTe-based laser heat-mode resist (AIST-LHR). Based on the electrical resistivity difference of amorphous and crystalline phases for this resist, an etching selectivity ratio of ≈30:1 (i.e., the etch ratio between the amorphous and crystalline ones) is achieved through the oxidation of Fe 3+ ions with the assisted pitting activation etching using Cl ions in an acid medium. Nanostructures with a minimum feature size down to 41 nm are successfully generated, including grating patterns, meta-surface optical structures, gears, and English characters. Using a post-plasma etching process, the nanostructures are successfully transferred from the AIST-HLR onto silica substrate, and X-ray grating patterns with a line space of 80 nm are created as a demonstration for its potential applications in DOEs.

Original languageEnglish
Article number2200249
JournalSmall
Early online date23 Mar 2022
DOIs
Publication statusE-pub ahead of print - 23 Mar 2022

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