Evaluation of Process Parameters Influence on the Mechanical Properties of RF Magnetron Sputtered TiC Thin-Film Coating

Olayinka Oluwatosin Abegunde*, Esther Titilayo Akinlabi, Oluseyi Philip Oladijo

*Corresponding author for this work

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

Abstract

The mechanical properties of a thin-film coating are very paramount to the development and applications for both research and industrial usages. Enhanced mechanical properties give vast options of applications, curb cost and mitigate the unprecedented failure of materials in services. Optimizing the process parameter is very crucial in developing thin-film coatings mechanical properties. Taguchi was used to develop the experimental matrix using three levels and three factors. Three different sputtering parameters were varied during the experimental process from low to high level. Mechanical characterizations using nanoindentation, nanoscratch and wear tests were performed on the samples to determine the optimal process parameter that yields the best mechanical properties. From Taguchi analysis, the RF power proves to be the most effective control factor in optimizing the hardness and Young’s modulus properties with a contribution rate of 70.4% and 84.4%, respectively.

Original languageEnglish
Title of host publicationTrends in Manufacturing and Engineering Management
Subtitle of host publication Select Proceedings of ICMechD 2019
EditorsS. Vijayan, Nachiappan Subramanian, K. Sankaranarayanasamy
Place of PublicationSingapore
PublisherSpringer
Pages145-155
Number of pages11
Edition1
ISBN (Electronic)9789811547454
ISBN (Print)9789811547447
DOIs
Publication statusPublished - 20 Aug 2020
Externally publishedYes
Event2nd International Conference on Mechanical Engineering Design, ICMechD 2019 - Chennai, India
Duration: 25 Apr 201926 Apr 2019

Publication series

NameLecture Notes in Mechanical Engineering
ISSN (Print)2195-4356
ISSN (Electronic)2195-4364

Conference

Conference2nd International Conference on Mechanical Engineering Design, ICMechD 2019
Country/TerritoryIndia
CityChennai
Period25/04/1926/04/19

Keywords

  • ANOVA
  • RF magnetron sputtering
  • Taguchi

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