Evolutions and distributions of Si nanocrystals and other Si oxidation states in Si-implanted SiO2 films

Dan Nicolau, Yang Liu, Tu Pei Chen, Man Siu Tse, Yong Qing Fu, Uwe Muller, John M. Dell

Research output: Contribution to journalArticlepeer-review

Abstract

In this study, X-ray photoelectron spectroscopy (XPS) is used to study the annealing effects on the structure and chemical states of Si-rich SiOx (x
Original languageEnglish
Pages (from-to)374-377
JournalProceedings of SPIE - The International Society for Optical Engineering
Volume5275
DOIs
Publication statusPublished - 29 Mar 2004

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