Evolutions and distributions of Si nanocrystals and other Si oxidation states in Si-implanted SiO2 films

Dan Nicolau; Yang Liu; Tu Pei Chen; Man Siu Tse; Yong Qing Fu; Uwe Muller; John M. Dell

doi:10.1117/12.529936

Evolutions and distributions of Si nanocrystals and other Si oxidation states in Si-implanted SiO2 films

Dan Nicolau, Yang Liu, Tu Pei Chen, Man Siu Tse, Yong Qing Fu, Uwe Muller, John M. Dell

Mathematics, Physics and Electrical Engineering

Research output: Contribution to journal › Article › peer-review

Abstract

In this study, X-ray photoelectron spectroscopy (XPS) is used to study the annealing effects on the structure and chemical states of Si-rich SiOx (x

Original language	English
Pages (from-to)	374-377
Journal	Proceedings of SPIE - The International Society for Optical Engineering
Volume	5275
DOIs	https://doi.org/10.1117/12.529936
Publication status	Published - 29 Mar 2004

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title = "Evolutions and distributions of Si nanocrystals and other Si oxidation states in Si-implanted SiO2 films",

abstract = "In this study, X-ray photoelectron spectroscopy (XPS) is used to study the annealing effects on the structure and chemical states of Si-rich SiOx (x",

author = "Dan Nicolau and Yang Liu and Chen, {Tu Pei} and Tse, {Man Siu} and Fu, {Yong Qing} and Uwe Muller and Dell, {John M.}",

year = "2004",

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day = "29",

doi = "10.1117/12.529936",

language = "English",

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publisher = "SPIE",

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Evolutions and distributions of Si nanocrystals and other Si oxidation states in Si-implanted SiO2 films. / Nicolau, Dan; Liu, Yang; Chen, Tu Pei; Tse, Man Siu; Fu, Yong Qing; Muller, Uwe; Dell, John M.

In: Proceedings of SPIE - The International Society for Optical Engineering, Vol. 5275, 29.03.2004, p. 374-377.

Research output: Contribution to journal › Article › peer-review

TY - JOUR

T1 - Evolutions and distributions of Si nanocrystals and other Si oxidation states in Si-implanted SiO2 films

AU - Nicolau, Dan

AU - Liu, Yang

AU - Chen, Tu Pei

AU - Tse, Man Siu

AU - Fu, Yong Qing

AU - Muller, Uwe

AU - Dell, John M.

PY - 2004/3/29

Y1 - 2004/3/29

N2 - In this study, X-ray photoelectron spectroscopy (XPS) is used to study the annealing effects on the structure and chemical states of Si-rich SiOx (x

AB - In this study, X-ray photoelectron spectroscopy (XPS) is used to study the annealing effects on the structure and chemical states of Si-rich SiOx (x

U2 - 10.1117/12.529936

DO - 10.1117/12.529936

M3 - Article

VL - 5275

SP - 374

EP - 377

JO - Proceedings of SPIE

JF - Proceedings of SPIE

SN - 0277-786X

ER -

Evolutions and distributions of Si nanocrystals and other Si oxidation states in Si-implanted SiO2 films

Abstract

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