Abstract
In this study, X-ray photoelectron spectroscopy (XPS) is used to study the annealing effects on the structure and chemical states of Si-rich SiOx (x
Original language | English |
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Pages (from-to) | 374-377 |
Journal | Proceedings of SPIE - The International Society for Optical Engineering |
Volume | 5275 |
DOIs | |
Publication status | Published - 29 Mar 2004 |