Fabrication of optical nanodevices through field-emission scanning probe lithography and cryogenic etching

Cemal Aydogan, Martin Hofmann, Claudia Lenk, Burkhard Volland, Ivo W. Rangelow, Mahmut Bicer, B. Erdem Alaca, Onur Ates, Hamdi Torun, Arda D. Yalcinkaya

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

1 Citation (Scopus)

Abstract

Sub-10 nanometer lithography is opening a new area for beyond-CMOS devices. Regarding to single nano-digit manufacturing we have established a new maskless patterning scheme by using field-emission, current controlled Scanning Probe Lithography (cc-SPL) in order to create optical nanodevices in thin silicon-on-insulator (SOI) substrates. This work aims to manufacture split ring resonators into calixarene resist by using SPL, while plasma etching at cryogenic temperatures is applied for an efficient pattern transfer into the underlying Si layer. Such electromagnetic resonators take the form of a ring with a narrow gap, whose 2D array was the first left-handed material tailored to demonstrate the so-called left-hand behavior of the wave propagation. It is shown that the resonance frequency can be tuned with the feature size of the resonator, and the resonance frequency can be shifted further into near infrared or even visible light regions.

Original languageEnglish
Title of host publicationNovel Patterning Technologies 2018
EditorsMartha I. Sanchez, Eric M. Panning
PublisherSPIE
Volume10584
ISBN (Electronic)9781510616608
DOIs
Publication statusPublished - 19 Mar 2018
Externally publishedYes
EventNovel Patterning Technologies 2018 - San Jose, United States
Duration: 26 Feb 20181 Mar 2018

Conference

ConferenceNovel Patterning Technologies 2018
CountryUnited States
CitySan Jose
Period26/02/181/03/18

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