Fabrication of optical nanodevices through field-emission scanning probe lithography and cryogenic etching

Cemal Aydogan; Martin Hofmann; Claudia Lenk; Burkhard Volland; Ivo W. Rangelow; Mahmut Bicer; B. Erdem Alaca; Onur Ates; Hamdi Torun; Arda D. Yalcinkaya

doi:10.1117/12.2305268

Fabrication of optical nanodevices through field-emission scanning probe lithography and cryogenic etching

Cemal Aydogan, Martin Hofmann, Claudia Lenk, Burkhard Volland, Ivo W. Rangelow, Mahmut Bicer, B. Erdem Alaca, Onur Ates, Hamdi Torun, Arda D. Yalcinkaya

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › peer-review

2 Citations (Scopus)

Abstract

Sub-10 nanometer lithography is opening a new area for beyond-CMOS devices. Regarding to single nano-digit manufacturing we have established a new maskless patterning scheme by using field-emission, current controlled Scanning Probe Lithography (cc-SPL) in order to create optical nanodevices in thin silicon-on-insulator (SOI) substrates. This work aims to manufacture split ring resonators into calixarene resist by using SPL, while plasma etching at cryogenic temperatures is applied for an efficient pattern transfer into the underlying Si layer. Such electromagnetic resonators take the form of a ring with a narrow gap, whose 2D array was the first left-handed material tailored to demonstrate the so-called left-hand behavior of the wave propagation. It is shown that the resonance frequency can be tuned with the feature size of the resonator, and the resonance frequency can be shifted further into near infrared or even visible light regions.

Original language	English
Title of host publication	Novel Patterning Technologies 2018
Editors	Martha I. Sanchez, Eric M. Panning
Publisher	SPIE
Volume	10584
ISBN (Electronic)	9781510616608
DOIs	https://doi.org/10.1117/12.2305268
Publication status	Published - 19 Mar 2018
Externally published	Yes
Event	Novel Patterning Technologies 2018 - San Jose, United States Duration: 26 Feb 2018 → 1 Mar 2018

Conference

Conference	Novel Patterning Technologies 2018
Country/Territory	United States
City	San Jose
Period	26/02/18 → 1/03/18

Keywords

cryogenic plasma etching
nanofabrication
scanning probe lithography
single nanometer manufacturing
split ring resonators

Access to Document

10.1117/12.2305268

Cite this

Aydogan, C., Hofmann, M., Lenk, C., Volland, B., Rangelow, I. W., Bicer, M., Alaca, B. E., Ates, O., Torun, H., & Yalcinkaya, A. D. (2018). Fabrication of optical nanodevices through field-emission scanning probe lithography and cryogenic etching. In M. I. Sanchez, & E. M. Panning (Eds.), Novel Patterning Technologies 2018 (Vol. 10584). Article 105841G SPIE. https://doi.org/10.1117/12.2305268

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title = "Fabrication of optical nanodevices through field-emission scanning probe lithography and cryogenic etching",

abstract = "Sub-10 nanometer lithography is opening a new area for beyond-CMOS devices. Regarding to single nano-digit manufacturing we have established a new maskless patterning scheme by using field-emission, current controlled Scanning Probe Lithography (cc-SPL) in order to create optical nanodevices in thin silicon-on-insulator (SOI) substrates. This work aims to manufacture split ring resonators into calixarene resist by using SPL, while plasma etching at cryogenic temperatures is applied for an efficient pattern transfer into the underlying Si layer. Such electromagnetic resonators take the form of a ring with a narrow gap, whose 2D array was the first left-handed material tailored to demonstrate the so-called left-hand behavior of the wave propagation. It is shown that the resonance frequency can be tuned with the feature size of the resonator, and the resonance frequency can be shifted further into near infrared or even visible light regions.",

keywords = "cryogenic plasma etching, nanofabrication, scanning probe lithography, single nanometer manufacturing, split ring resonators",

author = "Cemal Aydogan and Martin Hofmann and Claudia Lenk and Burkhard Volland and Rangelow, {Ivo W.} and Mahmut Bicer and Alaca, {B. Erdem} and Onur Ates and Hamdi Torun and Yalcinkaya, {Arda D.}",

year = "2018",

month = mar,

day = "19",

doi = "10.1117/12.2305268",

language = "English",

volume = "10584",

editor = "Sanchez, {Martha I.} and Panning, {Eric M.}",

booktitle = "Novel Patterning Technologies 2018",

publisher = "SPIE",

address = "United States",

note = "Novel Patterning Technologies 2018 ; Conference date: 26-02-2018 Through 01-03-2018",

}

Aydogan, C, Hofmann, M, Lenk, C, Volland, B, Rangelow, IW, Bicer, M, Alaca, BE, Ates, O, Torun, H & Yalcinkaya, AD 2018, Fabrication of optical nanodevices through field-emission scanning probe lithography and cryogenic etching. in MI Sanchez & EM Panning (eds), Novel Patterning Technologies 2018. vol. 10584, 105841G, SPIE, Novel Patterning Technologies 2018, San Jose, United States, 26/02/18. https://doi.org/10.1117/12.2305268

Fabrication of optical nanodevices through field-emission scanning probe lithography and cryogenic etching. / Aydogan, Cemal; Hofmann, Martin; Lenk, Claudia et al.
Novel Patterning Technologies 2018. ed. / Martha I. Sanchez; Eric M. Panning. Vol. 10584 SPIE, 2018. 105841G.

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › peer-review

TY - GEN

T1 - Fabrication of optical nanodevices through field-emission scanning probe lithography and cryogenic etching

AU - Aydogan, Cemal

AU - Hofmann, Martin

AU - Lenk, Claudia

AU - Volland, Burkhard

AU - Rangelow, Ivo W.

AU - Bicer, Mahmut

AU - Alaca, B. Erdem

AU - Ates, Onur

AU - Torun, Hamdi

AU - Yalcinkaya, Arda D.

PY - 2018/3/19

Y1 - 2018/3/19

N2 - Sub-10 nanometer lithography is opening a new area for beyond-CMOS devices. Regarding to single nano-digit manufacturing we have established a new maskless patterning scheme by using field-emission, current controlled Scanning Probe Lithography (cc-SPL) in order to create optical nanodevices in thin silicon-on-insulator (SOI) substrates. This work aims to manufacture split ring resonators into calixarene resist by using SPL, while plasma etching at cryogenic temperatures is applied for an efficient pattern transfer into the underlying Si layer. Such electromagnetic resonators take the form of a ring with a narrow gap, whose 2D array was the first left-handed material tailored to demonstrate the so-called left-hand behavior of the wave propagation. It is shown that the resonance frequency can be tuned with the feature size of the resonator, and the resonance frequency can be shifted further into near infrared or even visible light regions.

AB - Sub-10 nanometer lithography is opening a new area for beyond-CMOS devices. Regarding to single nano-digit manufacturing we have established a new maskless patterning scheme by using field-emission, current controlled Scanning Probe Lithography (cc-SPL) in order to create optical nanodevices in thin silicon-on-insulator (SOI) substrates. This work aims to manufacture split ring resonators into calixarene resist by using SPL, while plasma etching at cryogenic temperatures is applied for an efficient pattern transfer into the underlying Si layer. Such electromagnetic resonators take the form of a ring with a narrow gap, whose 2D array was the first left-handed material tailored to demonstrate the so-called left-hand behavior of the wave propagation. It is shown that the resonance frequency can be tuned with the feature size of the resonator, and the resonance frequency can be shifted further into near infrared or even visible light regions.

KW - cryogenic plasma etching

KW - nanofabrication

KW - scanning probe lithography

KW - single nanometer manufacturing

KW - split ring resonators

U2 - 10.1117/12.2305268

DO - 10.1117/12.2305268

M3 - Conference contribution

AN - SCOPUS:85050214412

VL - 10584

BT - Novel Patterning Technologies 2018

A2 - Sanchez, Martha I.

A2 - Panning, Eric M.

PB - SPIE

T2 - Novel Patterning Technologies 2018

Y2 - 26 February 2018 through 1 March 2018

ER -

Fabrication of optical nanodevices through field-emission scanning probe lithography and cryogenic etching

Abstract

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Keywords

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