Focused ion beam etching for the fabrication of micropillar microcavities made of III-V semiconductor materials

Y.-L. D. Ho, R. Gibson, C. Y. Hu, Martin J. Cryan, J. G. Rarity, P J Heard, J A Timpson, A. M. Fox, M. S. Skolnick, M. Hopkinson, A. Tahraoui

Research output: Contribution to journalArticlepeer-review

11 Citations (Scopus)

Abstract

The authors demonstrate a simple approach for the construction of single photon sources utilizing focused ion beam (FIB) etching, a maskless fabrication technique. Here they use FIB with gas-assisted etching to fabricate micropillar microcavities from a GaAs∕AlGaAs distributed Bragg reflector planar cavity containing self-assembled InAs quantum dots. Using a 1.5μm square pillar, they demonstrate a single photon source where the two photon emission is suppressed by a factor of 3.8. They believe this to be the first example of a FIB fabricated pillar single photon source.
Original languageEnglish
Pages (from-to)1197 - 1202
Number of pages6
JournalJournal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Volume25
Issue number4
Early online date20 Jun 2007
DOIs
Publication statusPublished - Jul 2007
Externally publishedYes

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