Functionally graded TiN/TiNi shape memory alloy films

Yong Qing Fu; Hejun Du; Sam Zhang

doi:10.1016/S0167-577X(02)01419-2

Functionally graded TiN/TiNi shape memory alloy films

Yong Qing Fu, Hejun Du, Sam Zhang

Mathematics, Physics and Electrical Engineering

Research output: Contribution to journal › Article › peer-review

200 Citations (Scopus)

Abstract

The presence of an adherent and hard TiN layer (200 nm) on TiNi-based shape memory alloy (SMA) film (3.5 μm) formed a passivation layer, improved hardness and tribological properties, without sacrificing the phase transformation and shape memory effect of the TiNi film.

Original language	English
Pages (from-to)	2995-2999
Journal	Materials Letters
Volume	57
Issue number	20
DOIs	https://doi.org/10.1016/S0167-577X(02)01419-2
Publication status	Published - Jun 2003

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@article{f1db4b625cf042f7876b8f4922b38aed,

title = "Functionally graded TiN/TiNi shape memory alloy films",

abstract = "The presence of an adherent and hard TiN layer (200 nm) on TiNi-based shape memory alloy (SMA) film (3.5 μm) formed a passivation layer, improved hardness and tribological properties, without sacrificing the phase transformation and shape memory effect of the TiNi film.",

keywords = "TiNi, Thin films, TiN, Sputtering, Shape memory",

author = "Fu, {Yong Qing} and Hejun Du and Sam Zhang",

year = "2003",

month = jun,

doi = "10.1016/S0167-577X(02)01419-2",

language = "English",

volume = "57",

pages = "2995--2999",

journal = "Materials Letters",

issn = "0167-577X",

publisher = "Elsevier",

number = "20",

}

TY - JOUR

T1 - Functionally graded TiN/TiNi shape memory alloy films

AU - Fu, Yong Qing

AU - Du, Hejun

AU - Zhang, Sam

PY - 2003/6

Y1 - 2003/6

N2 - The presence of an adherent and hard TiN layer (200 nm) on TiNi-based shape memory alloy (SMA) film (3.5 μm) formed a passivation layer, improved hardness and tribological properties, without sacrificing the phase transformation and shape memory effect of the TiNi film.

AB - The presence of an adherent and hard TiN layer (200 nm) on TiNi-based shape memory alloy (SMA) film (3.5 μm) formed a passivation layer, improved hardness and tribological properties, without sacrificing the phase transformation and shape memory effect of the TiNi film.

KW - TiNi

KW - Thin films

KW - TiN

KW - Sputtering

KW - Shape memory

U2 - 10.1016/S0167-577X(02)01419-2

DO - 10.1016/S0167-577X(02)01419-2

M3 - Article

VL - 57

SP - 2995

EP - 2999

JO - Materials Letters

JF - Materials Letters

SN - 0167-577X

IS - 20

ER -

Functionally graded TiN/TiNi shape memory alloy films

Abstract

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