In-situ synchrotron X-ray diffraction study of stress-induced phase transformation in Ti50.1Ni40.8Cu9.1 thin films

Hong Wang; Guangai Sun; Bo Chen; Yong Qing Fu; Xiaolin Wang; Xiao-Tao Zu; Hua Hai Shen; Yanping Liu; Liangbin Li; Guoqiang Pan; Liusi Sheng; Q. Tian

doi:10.1016/j.physb.2012.04.054

In-situ synchrotron X-ray diffraction study of stress-induced phase transformation in Ti50.1Ni40.8Cu9.1 thin films

Hong Wang, Guangai Sun, Bo Chen, Yong Qing Fu, Xiaolin Wang, Xiao-Tao Zu, Hua Hai Shen, Yanping Liu, Liangbin Li, Guoqiang Pan, Liusi Sheng, Q. Tian

Mathematics, Physics and Electrical Engineering

Research output: Contribution to journal › Article › peer-review

2 Citations (Scopus)

Abstract

Stress-induced martensitic transformation of as-sputtered and post-annealed Ti50.1Ni40.8Cu9.1 thin films was investigated using in-situ synchrotron X-ray diffraction (S-XRD) technique. For the as-deposited film, in-situ S-XRD analysis showed a martensitic transformation from parent phase to martensite during initial loading, followed by reorientation of martensite variants via detwinning. This detwinning process induced a strong 〈0 2 0〉 fiber texture along the loading direction and a strong 〈0 0 2〉 fiber texture perpendicular to the loading direction. For the 650 °C annealed film, there is only elastic deformation, followed by a martensitic transformation during deformation.

Original language	English
Pages (from-to)	3437-3440
Journal	Physica B: Condensed Matter
Volume	407
Issue number	17
DOIs	https://doi.org/10.1016/j.physb.2012.04.054
Publication status	Published - Sept 2012

Keywords

Shape memory
Ti–Ni–Cu thin film
stress-induced phase transformation
detwinning
synchrotron X-ray diffraction

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10.1016/j.physb.2012.04.054

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@article{2028d89a2aa7412cb6eb31988b0e03db,

title = "In-situ synchrotron X-ray diffraction study of stress-induced phase transformation in Ti50.1Ni40.8Cu9.1 thin films",

abstract = "Stress-induced martensitic transformation of as-sputtered and post-annealed Ti50.1Ni40.8Cu9.1 thin films was investigated using in-situ synchrotron X-ray diffraction (S-XRD) technique. For the as-deposited film, in-situ S-XRD analysis showed a martensitic transformation from parent phase to martensite during initial loading, followed by reorientation of martensite variants via detwinning. This detwinning process induced a strong 〈0 2 0〉 fiber texture along the loading direction and a strong 〈0 0 2〉 fiber texture perpendicular to the loading direction. For the 650 °C annealed film, there is only elastic deformation, followed by a martensitic transformation during deformation.",

keywords = "Shape memory, Ti–Ni–Cu thin film, stress-induced phase transformation, detwinning, synchrotron X-ray diffraction",

author = "Hong Wang and Guangai Sun and Bo Chen and Fu, {Yong Qing} and Xiaolin Wang and Xiao-Tao Zu and Shen, {Hua Hai} and Yanping Liu and Liangbin Li and Guoqiang Pan and Liusi Sheng and Q. Tian",

year = "2012",

month = sep,

doi = "10.1016/j.physb.2012.04.054",

language = "English",

volume = "407",

pages = "3437--3440",

journal = "Physica B: Condensed Matter",

issn = "0921-4526",

publisher = "Elsevier",

number = "17",

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TY - JOUR

T1 - In-situ synchrotron X-ray diffraction study of stress-induced phase transformation in Ti50.1Ni40.8Cu9.1 thin films

AU - Wang, Hong

AU - Sun, Guangai

AU - Chen, Bo

AU - Fu, Yong Qing

AU - Wang, Xiaolin

AU - Zu, Xiao-Tao

AU - Shen, Hua Hai

AU - Liu, Yanping

AU - Li, Liangbin

AU - Pan, Guoqiang

AU - Sheng, Liusi

AU - Tian, Q.

PY - 2012/9

Y1 - 2012/9

N2 - Stress-induced martensitic transformation of as-sputtered and post-annealed Ti50.1Ni40.8Cu9.1 thin films was investigated using in-situ synchrotron X-ray diffraction (S-XRD) technique. For the as-deposited film, in-situ S-XRD analysis showed a martensitic transformation from parent phase to martensite during initial loading, followed by reorientation of martensite variants via detwinning. This detwinning process induced a strong 〈0 2 0〉 fiber texture along the loading direction and a strong 〈0 0 2〉 fiber texture perpendicular to the loading direction. For the 650 °C annealed film, there is only elastic deformation, followed by a martensitic transformation during deformation.

AB - Stress-induced martensitic transformation of as-sputtered and post-annealed Ti50.1Ni40.8Cu9.1 thin films was investigated using in-situ synchrotron X-ray diffraction (S-XRD) technique. For the as-deposited film, in-situ S-XRD analysis showed a martensitic transformation from parent phase to martensite during initial loading, followed by reorientation of martensite variants via detwinning. This detwinning process induced a strong 〈0 2 0〉 fiber texture along the loading direction and a strong 〈0 0 2〉 fiber texture perpendicular to the loading direction. For the 650 °C annealed film, there is only elastic deformation, followed by a martensitic transformation during deformation.

KW - Shape memory

KW - Ti–Ni–Cu thin film

KW - stress-induced phase transformation

KW - detwinning

KW - synchrotron X-ray diffraction

U2 - 10.1016/j.physb.2012.04.054

DO - 10.1016/j.physb.2012.04.054

M3 - Article

SN - 0921-4526

VL - 407

SP - 3437

EP - 3440

JO - Physica B: Condensed Matter

JF - Physica B: Condensed Matter

IS - 17

ER -

In-situ synchrotron X-ray diffraction study of stress-induced phase transformation in Ti50.1Ni40.8Cu9.1 thin films

Abstract

Keywords

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