In-situ synchrotron X-ray diffraction study of stress-induced phase transformation in Ti50.1Ni40.8Cu9.1 thin films

Hong Wang, Guangai Sun, Bo Chen, Yong Qing Fu, Xiaolin Wang, Xiao-Tao Zu, Hua Hai Shen, Yanping Liu, Liangbin Li, Guoqiang Pan, Liusi Sheng, Q. Tian

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1 Citation (Scopus)

Abstract

Stress-induced martensitic transformation of as-sputtered and post-annealed Ti50.1Ni40.8Cu9.1 thin films was investigated using in-situ synchrotron X-ray diffraction (S-XRD) technique. For the as-deposited film, in-situ S-XRD analysis showed a martensitic transformation from parent phase to martensite during initial loading, followed by reorientation of martensite variants via detwinning. This detwinning process induced a strong 〈0 2 0〉 fiber texture along the loading direction and a strong 〈0 0 2〉 fiber texture perpendicular to the loading direction. For the 650 °C annealed film, there is only elastic deformation, followed by a martensitic transformation during deformation.
Original languageEnglish
Pages (from-to)3437-3440
JournalPhysica B: Condensed Matter
Volume407
Issue number17
DOIs
Publication statusPublished - Sep 2012

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