Manipulation of exposure dose parameters to improve production of high aspect ratio structures using SU-8

Rachael Daunton, Andrew Gallant, David Wood

Research output: Contribution to journalArticlepeer-review

11 Citations (Scopus)

Abstract

The detailed consideration of the chemistry occurring during the fabrication process is very important for SU-8 compared to other photoresists. In SU-8, the solvent does far more than just act as a carrier for the photoactive compounds: it plays a prominent role in the processing chemistry. In this paper we explain how the change of solvent from old to new formulations of SU-8 has an effect on the processing of this resist. We then show how, and why, in the modern 2000 series formulations the manipulation of the polymerization rate via variation of the exposure dose allows dark field features on a mask design to be reduced, in a controlled manner, by up to 30% while still maintaining good sidewall profiles in features.
Original languageEnglish
Pages (from-to)075016
JournalJournal of micromechanics and microengineering.
Volume22
Issue number7
DOIs
Publication statusPublished - 20 Jun 2012

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