Mechanical behaviour of sputtered aluminium thin films under high sliding loads

Fredrick M. Mwema; Esther T. Akinlabi; O. P. Oladijo

doi:10.4028/www.scientific.net/KEM.796.67

Mechanical behaviour of sputtered aluminium thin films under high sliding loads

Fredrick M. Mwema^*, Esther T. Akinlabi, O. P. Oladijo

^*Corresponding author for this work

Research output: Contribution to journal › Article › peer-review

3 Citations (Scopus)

Abstract

In this work, the wear behaviour of thin aluminium thin films (thickness range of 750-1500 nm) deposited on rough stainless-steel substrate through radio-frequency (rf) magnetron sputtering at varying substrate temperature (Ts) was studied. The films were studied under extremely high wear loads of 30 N and 50 N. The coefficient of friction and material loss are characterised as functions of the Ts of the deposited aluminium films. It was observed that due to the evolving microstructural and roughness properties of the films, the material behaviour of the films under extremely high sliding loads significantly depend on the substrate temperature. The most significant coefficient of friction was observed at 60^oC and 80^oC, and highest material loss was recorded at 100^oC. The material loss and variation of the coefficient of friction were related to the morphology (porosity and roughness) of the sputtered thin films.

Original language	English
Pages (from-to)	67-73
Number of pages	7
Journal	Key Engineering Materials
Volume	796
DOIs	https://doi.org/10.4028/www.scientific.net/KEM.796.67
Publication status	Published - 2019
Externally published	Yes

Keywords

Aluminium
Sputtering
Substrate temperature
Thin films
Wear

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10.4028/www.scientific.net/KEM.796.67

Cite this

@article{c68bcf95732045d6a07e78d675d0a667,

title = "Mechanical behaviour of sputtered aluminium thin films under high sliding loads",

abstract = "In this work, the wear behaviour of thin aluminium thin films (thickness range of 750-1500 nm) deposited on rough stainless-steel substrate through radio-frequency (rf) magnetron sputtering at varying substrate temperature (Ts) was studied. The films were studied under extremely high wear loads of 30 N and 50 N. The coefficient of friction and material loss are characterised as functions of the Ts of the deposited aluminium films. It was observed that due to the evolving microstructural and roughness properties of the films, the material behaviour of the films under extremely high sliding loads significantly depend on the substrate temperature. The most significant coefficient of friction was observed at 60oC and 80oC, and highest material loss was recorded at 100oC. The material loss and variation of the coefficient of friction were related to the morphology (porosity and roughness) of the sputtered thin films.",

keywords = "Aluminium, Sputtering, Substrate temperature, Thin films, Wear",

author = "Mwema, {Fredrick M.} and Akinlabi, {Esther T.} and Oladijo, {O. P.}",

note = "Publisher Copyright: {\textcopyright} 2019 Trans Tech Publications, Switzerland",

year = "2019",

doi = "10.4028/www.scientific.net/KEM.796.67",

language = "English",

volume = "796",

pages = "67--73",

journal = "Key Engineering Materials",

issn = "1013-9826",

publisher = "Trans Tech Publications",

}

TY - JOUR

T1 - Mechanical behaviour of sputtered aluminium thin films under high sliding loads

AU - Mwema, Fredrick M.

AU - Akinlabi, Esther T.

AU - Oladijo, O. P.

PY - 2019

Y1 - 2019

N2 - In this work, the wear behaviour of thin aluminium thin films (thickness range of 750-1500 nm) deposited on rough stainless-steel substrate through radio-frequency (rf) magnetron sputtering at varying substrate temperature (Ts) was studied. The films were studied under extremely high wear loads of 30 N and 50 N. The coefficient of friction and material loss are characterised as functions of the Ts of the deposited aluminium films. It was observed that due to the evolving microstructural and roughness properties of the films, the material behaviour of the films under extremely high sliding loads significantly depend on the substrate temperature. The most significant coefficient of friction was observed at 60oC and 80oC, and highest material loss was recorded at 100oC. The material loss and variation of the coefficient of friction were related to the morphology (porosity and roughness) of the sputtered thin films.

AB - In this work, the wear behaviour of thin aluminium thin films (thickness range of 750-1500 nm) deposited on rough stainless-steel substrate through radio-frequency (rf) magnetron sputtering at varying substrate temperature (Ts) was studied. The films were studied under extremely high wear loads of 30 N and 50 N. The coefficient of friction and material loss are characterised as functions of the Ts of the deposited aluminium films. It was observed that due to the evolving microstructural and roughness properties of the films, the material behaviour of the films under extremely high sliding loads significantly depend on the substrate temperature. The most significant coefficient of friction was observed at 60oC and 80oC, and highest material loss was recorded at 100oC. The material loss and variation of the coefficient of friction were related to the morphology (porosity and roughness) of the sputtered thin films.

KW - Aluminium

KW - Sputtering

KW - Substrate temperature

KW - Thin films

KW - Wear

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U2 - 10.4028/www.scientific.net/KEM.796.67

DO - 10.4028/www.scientific.net/KEM.796.67

M3 - Article

AN - SCOPUS:85064387715

SN - 1013-9826

VL - 796

SP - 67

EP - 73

JO - Key Engineering Materials

JF - Key Engineering Materials

ER -

Mechanical behaviour of sputtered aluminium thin films under high sliding loads

Abstract

Keywords

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