Mikromorphologie und nanomechanische Eigenschaften von gesputterten Aluminiumdünnschichten

Translated title of the contribution: Micromorphology and nanomechanical characteristics of sputtered aluminum thin films

F. M. Mwema*, E. T. Akinlabi, O. P. Oladijo

*Corresponding author for this work

Research output: Contribution to journalConference articlepeer-review

1 Citation (Scopus)

Abstract

Micromorphology and nanoindentation properties of sputtered aluminum thin films are presented. The field emission scanning electron microscope, atomic force microscopy (AFM) and nanoindentation results are presented for films prepared at a substrate temperature ranging between 44.5 °C and 100 °C. A multifractal approach on the microstructure is presented to comprehend the micromorphology of the films. The roughness decreases, whereas fractal dimension increases as the temperature increases. The hardness and Young's modulus do not exhibit any predictable trend. Hardness and Young's modulus exhibit a linear relationship.

Translated title of the contributionMicromorphology and nanomechanical characteristics of sputtered aluminum thin films
Original languageGerman
Pages (from-to)787-791
Number of pages5
JournalMaterialwissenschaft und Werkstofftechnik
Volume51
Issue number6
Early online date1 Jun 2020
DOIs
Publication statusPublished - 12 Jun 2020
Externally publishedYes
Event5th International Conference on Mechanical, Manufacturing and Plant Engineering, ICMMPE 2019 - Kuala Lumpur, Malaysia
Duration: 19 Nov 201921 Nov 2019

Keywords

  • Aluminum
  • magnetron sputtering
  • mono-fractal
  • multifractal
  • sputtering temperature
  • thin films

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