TY - JOUR
T1 - Multifractal and optical bandgap characterization of Ta2O5 thin films deposited by electron gun method
AU - Shakoury, Reza
AU - Rezaee, Sahar
AU - Mwema, Fredrick
AU - Luna, Carlos
AU - Ghosh, Koushik
AU - Jurečka, Stanislav
AU - Ţălu, Ştefan
AU - Arman, Ali
AU - Grayeli Korpi, Alireza
PY - 2020/2/1
Y1 - 2020/2/1
N2 - The micromorphology of tantalum pentoxide (Ta2O5) thin films, deposited on glass substrates by electron gun method, has been analyzed using atomic force microscopy (AFM), UV–Vis–NIR spectrophotometry and multifractal analyses. Two samples were grown at basic pressure of 7 × 10−6 mbar, work pressures of 1.3 × 10−4 and 2.0 × 10−4 mbar, and thicknesses of 0.38 μm and 0.39 μm, respectively. Subsequently, these samples were annealed at 300 °C for 2 h. The physical, structural and optical analyses were investigated by spectroscopic ellipsometry, spectrophotometry and AFM. The measured transmittance spectra were studied based on the Swanepoel method, whose results also yielded to the estimation of the film thickness and the refractive index. Finally, Ta2O5 thin films were characterized by AFM measurements and multifractal analyses for an accurate description of the 3-D surface microtexture features. The fractal examinations of the samples revealed that these microstructures exhibit multifractal characteristics. Essential parameters that characterized the thin films were compared and discussed thoroughly.
AB - The micromorphology of tantalum pentoxide (Ta2O5) thin films, deposited on glass substrates by electron gun method, has been analyzed using atomic force microscopy (AFM), UV–Vis–NIR spectrophotometry and multifractal analyses. Two samples were grown at basic pressure of 7 × 10−6 mbar, work pressures of 1.3 × 10−4 and 2.0 × 10−4 mbar, and thicknesses of 0.38 μm and 0.39 μm, respectively. Subsequently, these samples were annealed at 300 °C for 2 h. The physical, structural and optical analyses were investigated by spectroscopic ellipsometry, spectrophotometry and AFM. The measured transmittance spectra were studied based on the Swanepoel method, whose results also yielded to the estimation of the film thickness and the refractive index. Finally, Ta2O5 thin films were characterized by AFM measurements and multifractal analyses for an accurate description of the 3-D surface microtexture features. The fractal examinations of the samples revealed that these microstructures exhibit multifractal characteristics. Essential parameters that characterized the thin films were compared and discussed thoroughly.
KW - Atomic force microscopy
KW - Electron gun method
KW - Multifractal analysis
KW - Optical properties
KW - TaO thin films
UR - http://www.scopus.com/inward/record.url?scp=85078485629&partnerID=8YFLogxK
U2 - 10.1007/s11082-019-2173-5
DO - 10.1007/s11082-019-2173-5
M3 - Article
AN - SCOPUS:85078485629
VL - 52
JO - Optical and Quantum Electronics
JF - Optical and Quantum Electronics
SN - 0306-8919
IS - 2
M1 - 95
ER -