Abstract
We describe a technique for fabricating micro- and nanostructures incorporating fluorescent defects in diamond with a positional accuracy better than hundreds of nanometers. Using confocal fluorescence microscopy and focused ion beam etching, we initially locate a suitable defect with respect to registration marks on the diamond surface then etch a structure using these coordinates. We demonstrate the technique by etching an 8 μm diameter hemisphere positioned with single negatively charged nitrogen-vacancy defect lies at its origin. Direct comparison of the fluorescence photon count rate before and after fabrication shows an eightfold increase due to the presence of the hemisphere.
| Original language | English |
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| Article number | 133107 |
| Number of pages | 3 |
| Journal | Applied Physics Letters |
| Volume | 98 |
| Issue number | 13 |
| DOIs | |
| Publication status | Published - 30 Mar 2011 |
| Externally published | Yes |