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Optimisation of the performance characteristics of Cu-Al-Mo thin film resistors
Martin Birkett
Mechanical and Construction Engineering
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Physics & Astronomy
resistors
100%
optimization
64%
thin films
50%
performance
43%
molybdenum
32%
electrical resistivity
30%
chromium
30%
manufacturing
27%
coefficients
26%
tantalum nitrides
24%
copper
23%
aluminum
22%
theses
20%
chemical composition
14%
temperature
14%
heat treatment
13%
adjusting
13%
nickel
13%
electrical properties
11%
silicon
8%
lasers
7%