Phase transition and microstructure change in Ta–Zr alloy films by co-sputtering

Z. Z. Tang; Jang-Hsing Hsieh; Shanyong Zhang; C. Li; Yong Qing Fu

doi:10.1016/j.surfcoat.2004.10.019

Phase transition and microstructure change in Ta–Zr alloy films by co-sputtering

Z. Z. Tang, Jang-Hsing Hsieh, Shanyong Zhang, C. Li, Yong Qing Fu

Research output: Contribution to journal › Article › peer-review

19 Citations (Scopus)

Abstract

Ta–Zr Thin films with wide range of compositions were deposited on Si (100) substrate by co-sputtering. RF bias power from 0 to 80 W was applied during deposition. Films were then characterized by X-ray diffraction (XRD), scanning electron microscopy (SEM), X-ray photoelectron spectroscopy (XPS) and four-point probe. Result showed the incorporation of Zr caused the formation of low-resistivity BCC Ta, which made the resistivity of Ta–Zr films decrease. With substrate bias increasing, the compositional range for forming amorphous structure shrank. The effects of both thermodynamics and kinetics on Ta–Zr amorphization tendency were discussed.

Original language	English
Pages (from-to)	110-113
Journal	Surface and Coatings Technology
Volume	198
Issue number	1-3
DOIs	https://doi.org/10.1016/j.surfcoat.2004.10.019
Publication status	Published - 1 Aug 2005

Keywords

Co-sputtering
Ta–Zr
Amorphization

Access to Document

10.1016/j.surfcoat.2004.10.019

Cite this

@article{1603bc50ca6148a7a963c06e4ea349f5,

title = "Phase transition and microstructure change in Ta–Zr alloy films by co-sputtering",

abstract = "Ta–Zr Thin films with wide range of compositions were deposited on Si (100) substrate by co-sputtering. RF bias power from 0 to 80 W was applied during deposition. Films were then characterized by X-ray diffraction (XRD), scanning electron microscopy (SEM), X-ray photoelectron spectroscopy (XPS) and four-point probe. Result showed the incorporation of Zr caused the formation of low-resistivity BCC Ta, which made the resistivity of Ta–Zr films decrease. With substrate bias increasing, the compositional range for forming amorphous structure shrank. The effects of both thermodynamics and kinetics on Ta–Zr amorphization tendency were discussed.",

keywords = "Co-sputtering, Ta–Zr, Amorphization",

author = "Tang, \{Z. Z.\} and Jang-Hsing Hsieh and Shanyong Zhang and C. Li and Fu, \{Yong Qing\}",

year = "2005",

month = aug,

day = "1",

doi = "10.1016/j.surfcoat.2004.10.019",

language = "English",

volume = "198",

pages = "110--113",

journal = "Surface and Coatings Technology",

issn = "0257-8972",

publisher = "Elsevier B.V.",

number = "1-3",

}

TY - JOUR

T1 - Phase transition and microstructure change in Ta–Zr alloy films by co-sputtering

AU - Tang, Z. Z.

AU - Hsieh, Jang-Hsing

AU - Zhang, Shanyong

AU - Li, C.

AU - Fu, Yong Qing

PY - 2005/8/1

Y1 - 2005/8/1

N2 - Ta–Zr Thin films with wide range of compositions were deposited on Si (100) substrate by co-sputtering. RF bias power from 0 to 80 W was applied during deposition. Films were then characterized by X-ray diffraction (XRD), scanning electron microscopy (SEM), X-ray photoelectron spectroscopy (XPS) and four-point probe. Result showed the incorporation of Zr caused the formation of low-resistivity BCC Ta, which made the resistivity of Ta–Zr films decrease. With substrate bias increasing, the compositional range for forming amorphous structure shrank. The effects of both thermodynamics and kinetics on Ta–Zr amorphization tendency were discussed.

AB - Ta–Zr Thin films with wide range of compositions were deposited on Si (100) substrate by co-sputtering. RF bias power from 0 to 80 W was applied during deposition. Films were then characterized by X-ray diffraction (XRD), scanning electron microscopy (SEM), X-ray photoelectron spectroscopy (XPS) and four-point probe. Result showed the incorporation of Zr caused the formation of low-resistivity BCC Ta, which made the resistivity of Ta–Zr films decrease. With substrate bias increasing, the compositional range for forming amorphous structure shrank. The effects of both thermodynamics and kinetics on Ta–Zr amorphization tendency were discussed.

KW - Co-sputtering

KW - Ta–Zr

KW - Amorphization

UR - https://www.scopus.com/pages/publications/20744441852

U2 - 10.1016/j.surfcoat.2004.10.019

DO - 10.1016/j.surfcoat.2004.10.019

M3 - Article

SN - 0257-8972

SN - 1879-3347

VL - 198

SP - 110

EP - 113

JO - Surface and Coatings Technology

JF - Surface and Coatings Technology

IS - 1-3

ER -

Phase transition and microstructure change in Ta–Zr alloy films by co-sputtering

Abstract

Keywords

Access to Document

Other files and links

Fingerprint

Cite this