Radio Frequency Magnetron Sputtering Coatings of Biomedical Implants Using Nanostructured Titanium Carbide Thin films

Akinsanya D. Baruwa, Olayinka O. Abegunde*, Esther T. Akinlabi, Oluseyi P. Oladijo, Elizabeth M. Makhatha, Omolayo M. Ikumapayi, Shree Krishna, Jyotsna Dutta Majumdar

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

2 Citations (Scopus)

Abstract

RF Magnetron sputtering is a distinctive deposition process that has applicability for growing thin film coatings on the surface of any materials such as biomedical implants without the formation of excessive heat and alteration of the overall properties of the materials. In this research study, a 99.5% purity nanostructured titanium carbide (TiC) target was effectively deposited on biomedical implants (Ti6Al4V) substrates under various sputtering process parameters. A field emission scanning electron microscope was used to analyse the surface morphology, and an atomic force microscope was used to probe the topography of the thin film coatings. Low angle X-ray diffractometer and Raman spectroscopy were used to investigate the phase formation and structural properties of the thin film coatings to consolidate the surface characterisation. The young modulus and hardness of the TiC thin film coatings were investigated using nanoindentation. The evolving microstructure and surface roughness show significant reliance on the process parameters. All the thin film coatings are oriented towards (200) planar. From the grain sizes calculations, it was observed that samples produced at higher process parameters (RF power and temperature) exhibit the most diminutive grain sizes. All samples prepared at higher process parameters show an improved mechanical strength. It also established that sample L4 prepared at the highest temperature and higher RF power displayed the most robust properties.

Original languageEnglish
Article number138
JournalJournal of Bio- and Tribo-Corrosion
Volume7
Issue number4
Early online date30 Aug 2021
DOIs
Publication statusPublished - 1 Dec 2021
Externally publishedYes

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