Resistor trimming geometry; past, present and future

Maria Alafogianni, Roger Penlington, Martin Birkett

Research output: Contribution to journalConference articlepeer-review

4 Citations (Scopus)
3 Downloads (Pure)

Abstract

This paper explores the key developments in thin film resistive trimming geometry for use in the fabrication of discrete precision resistors. Firstly an introduction to the laser trimming process is given with respect to well established trim geometries such as the plunge, 'L' and serpentine cuts. The effect of these trim patterns on key electrical properties of resistance tolerance and temperature co-efficient of resistance (TCR) of the thin films is then discussed before the performance of more recent geometries such as the three-contact and random trim approaches are reviewed. In addition to the properties of the standard trim patterns, the concept of the heat affected zone (HAZ) and ablation energy and the effect of introducing a 'fine' trim in areas of low current density to improve device performance are also studied. It is shown how trimming geometry and laser parameters can be systematically controlled to produce thin film resistors of the required properties for varying applications such as high precision, long term stability and high power pulse performance.
Original languageEnglish
Article number012002
JournalIOP Conference Series: Materials Science and Engineering
Volume104
DOIs
Publication statusPublished - 21 Jan 2016
Event39th International Microelectronics and Packaging (IMAPS 2015) - Gdańsk
Duration: 1 Jan 2015 → …

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