TY - JOUR
T1 - RETRACTED
T2 - Influence of sputtering parameters on the structural and mechanical properties of TiC thin film coating
AU - Abegunde, Olayinka Oluwatosin
AU - Akinlabi, Esther Titilayo
AU - Oladijo, Oluseyi Philip
N1 - Funding Information: The authors will like to acknowledge the Council for Scientific and Industrial Research (CSIR) for bursary awarded to the first Author, as well as technical support received from the University of Johannesburg, South Africa.
PY - 2020/8/1
Y1 - 2020/8/1
N2 - Titanium carbide (TiC) nanostructured thin films coating were deposited on a commercially pure titanium (CpTi) substrate to enhance the surface properties using Radio Frequency (RF) Magnetron Sputtering coating technique. The sputtering time, power and temperature were varied during the process to study the influence of the sputtering parameters on the evolving properties of the thin films. The surface morphology of the films was studied using Field emission scanning electron microscope FESEM. Atomic force microscope was used to analyse the surface topography. The mechanical properties of the film were measured using nanoindentation. The structural properties were characterized using Grazing incidence X-ray diffraction, X-ray Photoelectron spectroscopy and Raman spectroscopy. The microstructure results of the planar view revealed the film microstructural evolution with varying sputtering parameters. The XRD analyses confirmed the presence of nanostructured TiC film with (1 1 0) preferential growth diffractogram. Absence of Raman active vibrational diffraction peaks was noticed for films with continuous and defect-free microstructure produced at RF power of 200 W. The Young modulus and hardness varied with the sputtering parameters with the highest hardness value attained at 250 W.
AB - Titanium carbide (TiC) nanostructured thin films coating were deposited on a commercially pure titanium (CpTi) substrate to enhance the surface properties using Radio Frequency (RF) Magnetron Sputtering coating technique. The sputtering time, power and temperature were varied during the process to study the influence of the sputtering parameters on the evolving properties of the thin films. The surface morphology of the films was studied using Field emission scanning electron microscope FESEM. Atomic force microscope was used to analyse the surface topography. The mechanical properties of the film were measured using nanoindentation. The structural properties were characterized using Grazing incidence X-ray diffraction, X-ray Photoelectron spectroscopy and Raman spectroscopy. The microstructure results of the planar view revealed the film microstructural evolution with varying sputtering parameters. The XRD analyses confirmed the presence of nanostructured TiC film with (1 1 0) preferential growth diffractogram. Absence of Raman active vibrational diffraction peaks was noticed for films with continuous and defect-free microstructure produced at RF power of 200 W. The Young modulus and hardness varied with the sputtering parameters with the highest hardness value attained at 250 W.
KW - Magnetron sputtering
KW - Process parameters
KW - Thin film
UR - http://www.scopus.com/inward/record.url?scp=85083310351&partnerID=8YFLogxK
U2 - 10.1016/j.apsusc.2020.146323
DO - 10.1016/j.apsusc.2020.146323
M3 - Article
AN - SCOPUS:85083310351
SN - 0169-4332
VL - 520
JO - Applied Surface Science
JF - Applied Surface Science
M1 - 146323
ER -