Rocking disc electro-deposition of copper films on Mo/MoSe2 substrates

Charles Cummings; Paul Frith; Guillaume Zoppi; Ian Forbes; Keith Rogers; David Lane; Frank Marken

doi:10.1016/j.tsf.2010.12.107

Rocking disc electro-deposition of copper films on Mo/MoSe2 substrates

Charles Cummings, Paul Frith, Guillaume Zoppi, Ian Forbes, Keith Rogers, David Lane, Frank Marken

Research output: Contribution to journal › Article › peer-review

5 Citations (Scopus)

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Abstract

A novel electro-deposition method based on a rocking disc system with π/3 amplitude and variable frequency is introduced. Uniform copper films were deposited from a 0.1 M CuSO4/3.0 M NaOH/0.2 M sorbitol bath directly onto 12.1 cm2 Mo/MoSe2 substrates with X-ray diffraction showing a thickness variation of ±5% over this area. Investigation of the mass transport conditions suggests (i) uniform diffusion over the sample, (ii) a rate of mass transport proportional to the square root of the rocking rate, and (iii) turbulent conditions, which are able to dislodge gas bubbles during electro-deposition.

Original language	English
Pages (from-to)	7458-7463
Journal	Thin Solid Films
Volume	519
Issue number	21
DOIs	https://doi.org/10.1016/j.tsf.2010.12.107
Publication status	Published - 31 Aug 2011

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10.1016/j.tsf.2010.12.107

Cummings 2011Rocking disc electro-deposition-revised versionSubmitted manuscript, 2.03 MB

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title = "Rocking disc electro-deposition of copper films on Mo/MoSe2 substrates",

abstract = "A novel electro-deposition method based on a rocking disc system with π/3 amplitude and variable frequency is introduced. Uniform copper films were deposited from a 0.1 M CuSO4/3.0 M NaOH/0.2 M sorbitol bath directly onto 12.1 cm2 Mo/MoSe2 substrates with X-ray diffraction showing a thickness variation of ±5\% over this area. Investigation of the mass transport conditions suggests (i) uniform diffusion over the sample, (ii) a rate of mass transport proportional to the square root of the rocking rate, and (iii) turbulent conditions, which are able to dislodge gas bubbles during electro-deposition.",

author = "Charles Cummings and Paul Frith and Guillaume Zoppi and Ian Forbes and Keith Rogers and David Lane and Frank Marken",

note = "Proceedings of the EMRS 2010 Spring Meeting Symposium M: Thin Film Chalcogenide Photovoltaic Materials.",

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T1 - Rocking disc electro-deposition of copper films on Mo/MoSe2 substrates

AU - Cummings, Charles

AU - Frith, Paul

AU - Zoppi, Guillaume

AU - Forbes, Ian

AU - Rogers, Keith

AU - Lane, David

AU - Marken, Frank

N1 - Proceedings of the EMRS 2010 Spring Meeting Symposium M: Thin Film Chalcogenide Photovoltaic Materials.

PY - 2011/8/31

Y1 - 2011/8/31

N2 - A novel electro-deposition method based on a rocking disc system with π/3 amplitude and variable frequency is introduced. Uniform copper films were deposited from a 0.1 M CuSO4/3.0 M NaOH/0.2 M sorbitol bath directly onto 12.1 cm2 Mo/MoSe2 substrates with X-ray diffraction showing a thickness variation of ±5% over this area. Investigation of the mass transport conditions suggests (i) uniform diffusion over the sample, (ii) a rate of mass transport proportional to the square root of the rocking rate, and (iii) turbulent conditions, which are able to dislodge gas bubbles during electro-deposition.

AB - A novel electro-deposition method based on a rocking disc system with π/3 amplitude and variable frequency is introduced. Uniform copper films were deposited from a 0.1 M CuSO4/3.0 M NaOH/0.2 M sorbitol bath directly onto 12.1 cm2 Mo/MoSe2 substrates with X-ray diffraction showing a thickness variation of ±5% over this area. Investigation of the mass transport conditions suggests (i) uniform diffusion over the sample, (ii) a rate of mass transport proportional to the square root of the rocking rate, and (iii) turbulent conditions, which are able to dislodge gas bubbles during electro-deposition.

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DO - 10.1016/j.tsf.2010.12.107

M3 - Article

SN - 0040-6090

VL - 519

SP - 7458

EP - 7463

JO - Thin Solid Films

JF - Thin Solid Films

IS - 21

ER -

Rocking disc electro-deposition of copper films on Mo/MoSe2 substrates

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