Substrate-tilt angle effect on structural and optical properties of sputtered ZnO film

Hua-Feng Pang; Guang An Zhang; Yong Liang Tang; Yong Qing Fu; Li Ping Wang; Xiao-Tao Zu; Frank Placido

doi:10.1016/j.apsusc.2012.07.114

Substrate-tilt angle effect on structural and optical properties of sputtered ZnO film

Hua-Feng Pang, Guang An Zhang, Yong Liang Tang, Yong Qing Fu, Li Ping Wang, Xiao-Tao Zu, Frank Placido

Mathematics, Physics and Electrical Engineering

Research output: Contribution to journal › Article › peer-review

18 Citations (Scopus)

Abstract

A new one-step method utilizing a special holder for a direct current magnetron sputtering system has enabled simultaneous deposition of ZnO films with different substrate tilt angles on quartz and silicon substrates. Observation from scanning electron microscopy shows that a typical columnar structure is obtained and the column inclination angle varies from 0° to 34°. From X-ray diffraction analysis, the strains in the ZnO films decrease with increasing substrate tilt angle, which is confirmed by the variation of the longitude optical phonon vibration in the Raman spectra. The band-gap energies decrease from 3.19 eV to 3.07 eV mainly due to the changes of strain relaxation induced by the defect variations in the films. Photoluminescence spectra revealed that the generation, type and concentration of the complex defects are influenced by the substrate tilt angle.

Original language	English
Pages (from-to)	747-753
Journal	Applied Surface Science
Volume	259
DOIs	https://doi.org/10.1016/j.apsusc.2012.07.114
Publication status	Published - 15 Oct 2012

Keywords

Sputtered ZnO film
substrate tilt angle
band-gap energy
photoluminescence
new one-step method

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10.1016/j.apsusc.2012.07.114

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title = "Substrate-tilt angle effect on structural and optical properties of sputtered ZnO film",

abstract = "A new one-step method utilizing a special holder for a direct current magnetron sputtering system has enabled simultaneous deposition of ZnO films with different substrate tilt angles on quartz and silicon substrates. Observation from scanning electron microscopy shows that a typical columnar structure is obtained and the column inclination angle varies from 0° to 34°. From X-ray diffraction analysis, the strains in the ZnO films decrease with increasing substrate tilt angle, which is confirmed by the variation of the longitude optical phonon vibration in the Raman spectra. The band-gap energies decrease from 3.19 eV to 3.07 eV mainly due to the changes of strain relaxation induced by the defect variations in the films. Photoluminescence spectra revealed that the generation, type and concentration of the complex defects are influenced by the substrate tilt angle.",

keywords = "Sputtered ZnO film, substrate tilt angle, band-gap energy, photoluminescence, new one-step method",

author = "Hua-Feng Pang and Zhang, {Guang An} and Tang, {Yong Liang} and Fu, {Yong Qing} and Wang, {Li Ping} and Xiao-Tao Zu and Frank Placido",

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doi = "10.1016/j.apsusc.2012.07.114",

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journal = "Applied Surface Science",

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TY - JOUR

T1 - Substrate-tilt angle effect on structural and optical properties of sputtered ZnO film

AU - Pang, Hua-Feng

AU - Zhang, Guang An

AU - Tang, Yong Liang

AU - Fu, Yong Qing

AU - Wang, Li Ping

AU - Zu, Xiao-Tao

AU - Placido, Frank

PY - 2012/10/15

Y1 - 2012/10/15

N2 - A new one-step method utilizing a special holder for a direct current magnetron sputtering system has enabled simultaneous deposition of ZnO films with different substrate tilt angles on quartz and silicon substrates. Observation from scanning electron microscopy shows that a typical columnar structure is obtained and the column inclination angle varies from 0° to 34°. From X-ray diffraction analysis, the strains in the ZnO films decrease with increasing substrate tilt angle, which is confirmed by the variation of the longitude optical phonon vibration in the Raman spectra. The band-gap energies decrease from 3.19 eV to 3.07 eV mainly due to the changes of strain relaxation induced by the defect variations in the films. Photoluminescence spectra revealed that the generation, type and concentration of the complex defects are influenced by the substrate tilt angle.

AB - A new one-step method utilizing a special holder for a direct current magnetron sputtering system has enabled simultaneous deposition of ZnO films with different substrate tilt angles on quartz and silicon substrates. Observation from scanning electron microscopy shows that a typical columnar structure is obtained and the column inclination angle varies from 0° to 34°. From X-ray diffraction analysis, the strains in the ZnO films decrease with increasing substrate tilt angle, which is confirmed by the variation of the longitude optical phonon vibration in the Raman spectra. The band-gap energies decrease from 3.19 eV to 3.07 eV mainly due to the changes of strain relaxation induced by the defect variations in the films. Photoluminescence spectra revealed that the generation, type and concentration of the complex defects are influenced by the substrate tilt angle.

KW - Sputtered ZnO film

KW - substrate tilt angle

KW - band-gap energy

KW - photoluminescence

KW - new one-step method

U2 - 10.1016/j.apsusc.2012.07.114

DO - 10.1016/j.apsusc.2012.07.114

M3 - Article

SN - 0169-4332

SN - 1873-5584

VL - 259

SP - 747

EP - 753

JO - Applied Surface Science

JF - Applied Surface Science

ER -

Substrate-tilt angle effect on structural and optical properties of sputtered ZnO film

Abstract

Keywords

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