TY - GEN
T1 - Test structure for characterising low voltage coplanar EWOD system
AU - Li, Yifan
AU - Yoshio, Mita
AU - Haworth, Les
AU - Parkes, William
AU - Kubota, Masanori
AU - Walton, Anthony
PY - 2008/9/15
Y1 - 2008/9/15
N2 - This paper presents test structures designed for studying the relationship between the operation voltage and the configuration of electrode area for coplanar EWOD (ElectroWetting On Dielectrics) devices. Robust anodic Ta 2O5 dielectric and thin aFP (amorphous Fluoropolymer) have been used to fabricate the structures. Test structures have been used to characterise the significant contact angle change on asymmetric configurations, 114° to 81° on CYTOP (amorphous fluoropolymer from Asahi Glass Co. Ltd.) with an applied voltage of less than 20V. This demonstrates that by modifying the design, the operating voltage can be reduced by a factor of two, compared to the existing symmetric coplanar EWOD structures. Droplet manipulation on a coplanar EWOD system with this new design has been successfully demonstrated, with a driving voltage of 15V.
AB - This paper presents test structures designed for studying the relationship between the operation voltage and the configuration of electrode area for coplanar EWOD (ElectroWetting On Dielectrics) devices. Robust anodic Ta 2O5 dielectric and thin aFP (amorphous Fluoropolymer) have been used to fabricate the structures. Test structures have been used to characterise the significant contact angle change on asymmetric configurations, 114° to 81° on CYTOP (amorphous fluoropolymer from Asahi Glass Co. Ltd.) with an applied voltage of less than 20V. This demonstrates that by modifying the design, the operating voltage can be reduced by a factor of two, compared to the existing symmetric coplanar EWOD structures. Droplet manipulation on a coplanar EWOD system with this new design has been successfully demonstrated, with a driving voltage of 15V.
UR - http://www.scopus.com/inward/record.url?scp=51349146664&partnerID=8YFLogxK
U2 - 10.1109/ICMTS.2008.4509318
DO - 10.1109/ICMTS.2008.4509318
M3 - Conference contribution
AN - SCOPUS:51349146664
SN - 9781424418008
T3 - IEEE International Conference on Microelectronic Test Structures
SP - 80
EP - 85
BT - 2008 IEEE Conference on Microelectronic Test Structures, ICMTS
T2 - 2008 IEEE Conference on Microelectronic Test Structures, ICMTS
Y2 - 24 March 2008 through 27 March 2008
ER -