The role of fabrication techniques on the performance of widely tunable micromachined capacitors

Andrew Gallant; David Wood

doi:10.1016/j.sna.2003.07.006

The role of fabrication techniques on the performance of widely tunable micromachined capacitors

Andrew Gallant, David Wood

Mathematics, Physics and Electrical Engineering

Research output: Contribution to journal › Article › peer-review

13 Citations (Scopus)

Abstract

Coventorware 2001.1® is used to identify key vertical dimensions for the low voltage operation of a two-gap widely tunable capacitor. Using identical masking stages, two varieties of tunable capacitor are presented. Nickel structures are demonstrated which have a tuning ratio of 5.1:1 from an initial capacitance of 0.7 pF. Gold devices exhibit a tuning ratio of 7.3:1 from an initial capacitance of 1.5 pF. These are the most widely tunable devices reported to date.

Original language	English
Pages (from-to)	423-431
Number of pages	9
Journal	Sensors and actuators A : physical.
Volume	110
Issue number	1-3
DOIs	https://doi.org/10.1016/j.sna.2003.07.006
Publication status	Published - 1 Feb 2004

Keywords

RF-MEMS
Varactor
Pull-in
Electroplating
Tuning-range
MEMS

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10.1016/j.sna.2003.07.006

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title = "The role of fabrication techniques on the performance of widely tunable micromachined capacitors",

abstract = "Coventorware 2001.1{\textregistered} is used to identify key vertical dimensions for the low voltage operation of a two-gap widely tunable capacitor. Using identical masking stages, two varieties of tunable capacitor are presented. Nickel structures are demonstrated which have a tuning ratio of 5.1:1 from an initial capacitance of 0.7 pF. Gold devices exhibit a tuning ratio of 7.3:1 from an initial capacitance of 1.5 pF. These are the most widely tunable devices reported to date.",

keywords = "RF-MEMS, Varactor, Pull-in, Electroplating, Tuning-range, MEMS",

author = "Andrew Gallant and David Wood",

note = "Selected Papers from Eurosensors XVI Prague, Czech Republic Prague, Czech Republic, 15 September - 18 September 2002 Edited by P.J. French",

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AU - Wood, David

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N2 - Coventorware 2001.1® is used to identify key vertical dimensions for the low voltage operation of a two-gap widely tunable capacitor. Using identical masking stages, two varieties of tunable capacitor are presented. Nickel structures are demonstrated which have a tuning ratio of 5.1:1 from an initial capacitance of 0.7 pF. Gold devices exhibit a tuning ratio of 7.3:1 from an initial capacitance of 1.5 pF. These are the most widely tunable devices reported to date.

AB - Coventorware 2001.1® is used to identify key vertical dimensions for the low voltage operation of a two-gap widely tunable capacitor. Using identical masking stages, two varieties of tunable capacitor are presented. Nickel structures are demonstrated which have a tuning ratio of 5.1:1 from an initial capacitance of 0.7 pF. Gold devices exhibit a tuning ratio of 7.3:1 from an initial capacitance of 1.5 pF. These are the most widely tunable devices reported to date.

KW - RF-MEMS

KW - Varactor

KW - Pull-in

KW - Electroplating

KW - Tuning-range

KW - MEMS

U2 - 10.1016/j.sna.2003.07.006

DO - 10.1016/j.sna.2003.07.006

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JO - Sensors and actuators A : physical.

JF - Sensors and actuators A : physical.

IS - 1-3

ER -

The role of fabrication techniques on the performance of widely tunable micromachined capacitors

Abstract

Keywords

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