TiO 2  films prepared using plasma ion assisted deposition for photocatalytic application

C. Zhao; D. Child; D. Gibson; F. Placido; Richard Y.q. Fu

doi:10.1016/j.materresbull.2014.09.022

TiO 2 films prepared using plasma ion assisted deposition for photocatalytic application

C. Zhao, D. Child, D. Gibson, F. Placido, Richard Y.q. Fu

Mathematics, Physics and Electrical Engineering

Research output: Contribution to journal › Article › peer-review

7 Citations (Scopus)

Original language	English
Pages (from-to)	890-894
Journal	Materials Research Bulletin
Volume	60
DOIs	https://doi.org/10.1016/j.materresbull.2014.09.022
Publication status	Published - 1 Dec 2014

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10.1016/j.materresbull.2014.09.022

Cite this

@article{990f563d0fdc4ecb94190c8cb98eb1de,

title = "TiO 2 films prepared using plasma ion assisted deposition for photocatalytic application",

keywords = "Thin films, plasma deposition, X-ray diffraction, electron microscopy, crystal structure, catalytic properties",

author = "C. Zhao and D. Child and D. Gibson and F. Placido and Fu, {Richard Y.q.}",

year = "2014",

month = dec,

day = "1",

doi = "10.1016/j.materresbull.2014.09.022",

language = "English",

volume = "60",

pages = "890--894",

journal = "Materials Research Bulletin",

issn = "0025-5408",

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TY - JOUR

T1 - TiO 2 films prepared using plasma ion assisted deposition for photocatalytic application

AU - Zhao, C.

AU - Child, D.

AU - Gibson, D.

AU - Placido, F.

AU - Fu, Richard Y.q.

PY - 2014/12/1

Y1 - 2014/12/1

KW - Thin films

KW - plasma deposition

KW - X-ray diffraction

KW - electron microscopy

KW - crystal structure

KW - catalytic properties

U2 - 10.1016/j.materresbull.2014.09.022

DO - 10.1016/j.materresbull.2014.09.022

M3 - Article

VL - 60

SP - 890

EP - 894

JO - Materials Research Bulletin

JF - Materials Research Bulletin

SN - 0025-5408

ER -